Nomierinoša maska ar kumelīšu ekstraktu Hyggee Relief Chamomile Mask

Ingredients:

Water, Chamomilla Recutita (Matricaria) Flower Extract, Propanediol, Dipropylene Glycol, Betaine, Sodium Guaiazulene Sulfonate, Madecassic Acid, Asiaticoside, Asiatic Acid, Citric Acid, Camellia Sinensis Leaf Extract, Sodium Hyaluronate, Hydrolyzed Hyaluronic Acid, Dipotassium Glycyrrhizate, Centella Asiatica Extract, Portulaca Oleracea Extract, Madecassoside, Tocopherol, Trehalose, Allantoin, Butylene Glycol, Hydroxyacetophenone, 1,2-Hexanediol, Caprylyl Glycol, Ethylhexylglycerin, Disodium EDTA